Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source.

MLA

Qerimi, Dren, et al. “Tin Removal by an Annular Surface Wave Plasma Antenna in an Extreme Ultraviolet Lithography Source.” Journal of Applied Physics, vol. 132, no. 11, Sept. 2022, pp. 1–15. EBSCOhost, https://doi.org/10.1063/5.0094375.

APA

Qerimi, D., Herschberg, A. C., Panici, G., Hays, P., Pohlman, T., & Ruzic, D. N. (2022). Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source. Journal of Applied Physics, 132(11), 1–15. https://doi.org/10.1063/5.0094375

Chicago

Qerimi, Dren, Andrew C. Herschberg, Gianluca Panici, Parker Hays, Tyler Pohlman, and David N. Ruzic. 2022. “Tin Removal by an Annular Surface Wave Plasma Antenna in an Extreme Ultraviolet Lithography Source.” Journal of Applied Physics 132 (11): 1–15. doi:10.1063/5.0094375.