Tailoring the structural and optical properties of HiPIMS TiO2 thin films for photovoltaic applications.

Titanium dioxide (TiO 2) thin films are deposited onto glass and silicon <100> substrates by high power impulse magnetron sputtering (HiPIMS) at various substrate positions from the substrate-holder center (x = 0, 10, 20 and 30 mm). The structural analysis conducted through XRD and Raman spectroscopy shows that all the films deposited at lower radial distance (x = 0–20 mm) are identified as pure anatase phase of TiO 2 , while those deposited at 30 mm contain a small trace of rutile phase with anatase phase remaining dominant. AFM analysis reveals homogenous surfaces with low values of roughness (2.6–3.8 nm) and a decrease of grain size with the substrate position. The films exhibit high refractive index and large indirect optical band gaps (3.25–3.38 eV). Finally, UV-blocking and antireflection characteristics are studied. [Display omitted] • TiO 2 thin films are deposited on glass substrates by HiPIMS technique at different radial positions. • Pure anatase TiO 2 is obtained at low distances from the substrate to the holder center. • Good UV-blocking and antireflection effects can be reached from a proper tuning of the sample position. [ABSTRACT FROM AUTHOR]