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Quad-Level Cell Switching with Excellent Reliability in TiN/AlOx:Ti/TaOx/TiN Memory Device.

Authors :
Shin, Hee Ju
Seo, Hyun Kyu
Lee, Su Yeon
Park, Minsoo
Park, Seong-Geon
Yang, Min Kyu
Source :
Materials (1996-1944). Apr2022, Vol. 15 Issue 7, p2402-2402. 8p.
Publication Year :
2022

Abstract

TiN/AlOx:Ti/TaOx/TiN memory devices using bilayer resistive switching memory demonstrated excellent durability and capability of QLC (quad-level cell) memory devices. The best nonvolatile memory characteristics with the lowest operation current and optimized 4 bit/cell states were obtained using the Incremental Step Pulse Programming (ISPP) algorithm in array. As a result, a superior QLC reliability (cycle endurance > 1 k at each level of the QLC, data retention > 2 h at 125 °C) for all the 4 bits/cell operations was achieved in sub-μm scaled RRAM (resistive random access memory) devices. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
19961944
Volume :
15
Issue :
7
Database :
Academic Search Index
Journal :
Materials (1996-1944)
Publication Type :
Academic Journal
Accession number :
156325369
Full Text :
https://doi.org/10.3390/ma15072402