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Phase tailoring of Ta films via buffer layer-thicknesses controlling.

Authors :
Zuo, J.D.
Wang, Y.Q.
Wu, K.
Zhang, J.Y.
Liu, G.
Sun, J.
Source :
Scripta Materialia. Apr2022, Vol. 212, pN.PAG-N.PAG. 1p.
Publication Year :
2022

Abstract

Hard β-Ta phase is generally produced during Ta film deposition. While in some cases, soft α-Ta phase is preferred to ensure deformation capability. In this work, templated growth strategy by introducing Cr buffer layer is proposed to tailor the phase composition in Ta films. A broad spectrum of β-Ta/α-Ta ratio from 90% to 0% can be continuously and precisely achieved when the buffer layer thickness is correspondingly controlled from 0 to ∼90 nm. Hardness of the Ta films is well proportional to the β-Ta/α-Ta ratio. The underlying mechanism of phase tailoring is rationalized by demonstrating the thickness-dependent crystallization of buffer layer. [Display omitted]. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
13596462
Volume :
212
Database :
Academic Search Index
Journal :
Scripta Materialia
Publication Type :
Academic Journal
Accession number :
155338780
Full Text :
https://doi.org/10.1016/j.scriptamat.2022.114582