The effect of cavities on recrystallization growth of high-fluence He implanted-SiC.

• The effect of cavities on recrystallization growth in SiC was investigated. • The formed cavities can retard the epitaxial growth. • Nanocrystalline SiC was observed in the cavity layer. The effect of cavities on recrystallization growth of amorphous SiC induced by a high fluence He implantation was investigated. 300 keV He ions were used to implant the 6H-SiC (0001) wafer to a fluence of 4.4 × 1017/cm2 at room temperature. A buried amorphous layer with a width of approximately 468 nm was formed. Moreover, many spherical bubbles with diameters over 25 nm were observed by transmission electron microscopy. Recrystallization of the buried amorphous layer was visible after 900 °C annealing for 30 min. Some irregular cavities were found in the damaged layer. The recrystallization started from the amorphous/crystalline interface, and the formed cavities retarded the epitaxial growth. Nanocrystalline SiC was formed in the cavity layer. Extended defects were also characterized by transmission electron microscopy. The research results will give an insight into the recrystallization process in amorphous SiC. [ABSTRACT FROM AUTHOR]