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Single-Event-Induced Charge Collection in Ge-Channel pMOS FinFETs.

Authors :
Rony, M. W.
Samsel, Isaak K.
Zhang, En Xia
Sternberg, Andrew
Li, Kan
Reaz, Mahmud
Austin, Stephanie M.
Alles, Michael L.
Linten, Dimitri
Mitard, Jerome
Reed, Robert A.
Fleetwood, Daniel M.
Schrimpf, Ronald D.
Source :
IEEE Transactions on Nuclear Science. May2021, Vol. 68 Issue 5, p807-814. 8p.
Publication Year :
2021

Abstract

Peak transient currents due to pulsed-laser or heavy-ion irradiation of Ge $p$ MOS FinFETs are nearly independent of gate bias. This is because the prompt photocurrent is due primarily to a transient source–drain shunt. In contrast, long-term diffusion charge collection is strongly gate-bias dependent. This bias dependence results from hole injection from the source in response to the transient increase in electron concentration in the channel. The transients measured at the source terminal change polarity when the strike location moves from the source to the drain, but this effect does not occur for the transients measured at the drain terminal. Charge collection mechanisms are studied using TCAD simulations. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189499
Volume :
68
Issue :
5
Database :
Academic Search Index
Journal :
IEEE Transactions on Nuclear Science
Publication Type :
Academic Journal
Accession number :
150449170
Full Text :
https://doi.org/10.1109/TNS.2021.3072068