Parameterization of photobleaching and photodarkening in-situ kinetics in thermally deposited GeSe2 thin films.

MLA

Kovalskiy, Andriy, et al. “Parameterization of Photobleaching and Photodarkening In-Situ Kinetics in Thermally Deposited GeSe2 Thin Films.” Thin Solid Films, vol. 726, May 2021, p. N.PAG. EBSCOhost, https://doi.org/10.1016/j.tsf.2021.138659.

APA

Kovalskiy, A., Allen, J. A., Golovchak, R., Oelgoetz, J., Shpotyuk, O., Vlcek, M., & Palka, K. (2021). Parameterization of photobleaching and photodarkening in-situ kinetics in thermally deposited GeSe2 thin films. Thin Solid Films, 726, N.PAG. https://doi.org/10.1016/j.tsf.2021.138659

Chicago

Kovalskiy, Andriy, Joshua A. Allen, Roman Golovchak, Justin Oelgoetz, Oleh Shpotyuk, Miroslav Vlcek, and Karel Palka. 2021. “Parameterization of Photobleaching and Photodarkening In-Situ Kinetics in Thermally Deposited GeSe2 Thin Films.” Thin Solid Films 726 (May): N.PAG. doi:10.1016/j.tsf.2021.138659.