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Design Optimization Techniques in Nanosheet Transistor for RF Applications.

Authors :
Kushwaha, Pragya
Dasgupta, Avirup
Kao, Ming-Yen
Agarwal, Harshit
Salahuddin, Sayeef
Hu, Chenming
Source :
IEEE Transactions on Electron Devices. Oct2020, Vol. 67 Issue 10, p4515-4520. 6p.
Publication Year :
2020

Abstract

Nanosheet gate-all-around transistors are analyzed for RF applications using calibrated TCAD simulations. The effects of stack spacing and number of stacks on device performance are studied and a substack design for improved RF performance is proposed. The novel substack design can improve cut-off frequency (Ft) by ~10% and minimum number of substacks and minimum substack spacing should be used. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
67
Issue :
10
Database :
Academic Search Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
147319631
Full Text :
https://doi.org/10.1109/TED.2020.3019022