Local structural investigations of Fe-doped TiO2 amorphous thin films.

• Fe-doped TiO 2 amorphous thin films deposited using rf magnetron sputtering. • Band-gap energy reduction with Fe doping due to oxygen vacancy. • Maximum Fe substitution is up to 2 at. % doping. The present study deals with the local structure of amorphous TiO 2 and Fe-doped TiO 2 thin films deposited on Si substrate using magnetron sputtering. The absence of long range order is confirmed by grazing incidence x-ray diffraction and the short range order is studied using x-ray absorption near edge structure (XANES) measurements at Ti, Fe and O K-edges and Fe and Ti L 3 -edge. The XANES provides understanding about the electronic transition induced from the short range ordering and dependence of electronic hybridization of the central Ti- p orbitals with the Ti- d orbitals. The XANES measurements also show that maximum Fe doping concentration allowed to replace Ti is 2 at.% and after that separate phase starts appearing, which is consistent with simulation by ab-initio multiple scattering theory based code FEFF9. Ellipsometry measurements show gradual decrease in band-gap energy upto 2 at.% Fe doping from pristine TiO 2 , however a drastic decrease in band-gap energy is observed at 4 at.% or higher doping concentration due to formation of other phases. [ABSTRACT FROM AUTHOR]