Interferência da luz: uma correlação entre o experimento de Young e a litografia interferométrica.

This work aims to relate Young's experiment with an experimental technique for periodic structures fabrication known as two-beam interference lithography. The relationship between the experiments was made in terms of intensity distribution, considering a vectorial approach, where the superposition of two plane waves was used as a starting point. Within the limits considered in Young's experiment, the results show that the intensity distribution of both experiments coincide. In addition, this study provides a broader discussion on light interference, particularly the use of this phenomenon in technological applications. [ABSTRACT FROM AUTHOR]