Reactive ion etching of single crystal diamond by inductively coupled plasma: State of the art and catalog of recipes.

Authors :: Toros, A.
Kiss, M.
Graziosi, T.
Mi, S.
Berrazouane, R.
Naamoun, M.
Vukajlovic Plestina, J.
Gallo, P.
Quack, N.
Source :: Diamond & Related Materials. Oct2020, Vol. 108, pN.PAG-N.PAG. 1p.
Publication Year :: 2020
Abstract: Unlabelled Image • Review of the state of the art on reactive ion etching of single crystal diamond • In-depth analysis of diamond ICP RIE process parameters • Quantitative analysis of reported etch rates, selectivity and etch depths • Comprehensive catalog of diamond ICP RIE recipes providing selection guidelines [ABSTRACT FROM AUTHOR]

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