Zamanla Değişen Alttaş Sıcaklığının Ultrasonik Sprey Piroliz Yöntemiyle Üretilen CdS İnce Filmlerin Yapısal Özellikleri Üzerine Etkisi.

In this study, cadmium sulfide (CdS) n-type semiconductor material was produced on glass substrates by ultrasonic spray pyrolysis system (USP). During the deposition process of the films, production was realized by gradually increasing the substrate temperature between 100 - 350 °C. After production, a group of samples from CdS thin films were annealed in atmosphere ambiance at 380 °C. To define the crystal structure, surface morphology, elemental composition, and electro-optical properties of as deposited and annealed CdS films; grazing incidence X-Ray diffraction (GIXRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive spectrometer (EDS), and Uv-Vis spectrometer systems were used, respectively. It was seen that the results obtained from the characterization systems supported each other and these results were consistent with the literature. In addition, it was seen that pyrolysis method is a method preventing oxidation of the other layers by CdS which is produced as tampon layer in the semiconductor devices during this process resulting from high temperature. [ABSTRACT FROM AUTHOR]