Study of SU‐8 photoresist cross‐linking process by atomic force acoustic microscopy.

Summary: In this paper, a method is presented to detect the different phases of epoxy cross‐linking process and the subsurface structures of SU‐8 thin films by atomic force acoustic microscopy (AFAM). The AFAM imaging of SU‐8 thin films was investigated under different exposure and bake conditions. Optimized conditions were obtained for the cross‐linking of SU‐8 thin film at the exposure does of eight laser pulses with the laser fluence 10 mJ cm–2 per pulse and the post exposure bake (PEB) time at 90 s. The subsurface structures of undeveloped SU‐8 thin films were visible in the AFAM images. This method provides an effective and low‐cost way for the determination of different phases of epoxy cross‐linking process in nanostructured compounds, for the non‐destructive testing of subsurface defects, and for the evaluation of the quality of patterned structures. [ABSTRACT FROM AUTHOR]