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Detection Characteristics of Ge Detectors With Microstructured Amorphous Ge Contacts.
- Source :
-
IEEE Transactions on Nuclear Science . Jun2004 Part 3 of 4, Vol. 51 Issue 3, p1129-1133. 5p. - Publication Year :
- 2004
-
Abstract
- The established technique for producing position-sensitive structures by means of photolithography and subsequent plasma etching of grooves through detector contacts was applied for amorphous germanium contacts (a-Ge contacts). A simple 50-strip structure with a pitch of 615 μm was produced. Charge sharing between two adjacent strips (33 mm length) was investigated with the aid of 60-keV photons and 5.8-MeY α-particles. No charge losses were detected when irradiating the structured α-Ge contact of the 16-mm-thick detector with 60-keV photons. The same was concluded for n-particles hitting the unstructured p+-contact made by boron implantation. Moreover, excellent position information for α-particles, with an accuracy of about 30 μm, could be extracted in this case. Surprising results were obtained for α-particles impinging on the structured a-Ge contact. No coincident signals from the two adjacent strips caused by α-particles were observed. But a normally positive signal from one of the strips occasionally coincided with a negative signal from the other strip and vice versa. Using a cooled FET assembly mounted near a strip, an energy resolution of 0.78 keV [FWHM] for 60-keV photons was achieved and a slightly better resolution for lower energies. Even better energy resolutions will probably be possible, because the measuring setup was far from being optimized. [ABSTRACT FROM AUTHOR]
- Subjects :
- *PLASMA etching
*GERMANIUM diodes
*PHOTONS
*PHOTOLITHOGRAPHY
*ETCHING
*ELECTRON tubes
Subjects
Details
- Language :
- English
- ISSN :
- 00189499
- Volume :
- 51
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Nuclear Science
- Publication Type :
- Academic Journal
- Accession number :
- 14024655