Back to Search
Start Over
Fabrication of nickel oxide nanoparticles in SiO2 by metal-ion implantation combined with thermal oxidation.
- Source :
-
Applied Physics Letters . 8/9/2004, Vol. 85 Issue 6, p1015-1017. 3p. 1 Diagram, 3 Graphs. - Publication Year :
- 2004
-
Abstract
- A method is proposed to synthesize oxide nanoparticles in insulators, using metal-ion implantation and following thermal oxidation, which introduces less damage compared to the sequential implantation of metal ions and oxygen ions. Ni-oxide nanoparticles are formed in O2 gas flow at ∼800 °C for 1 h, through thermal oxidation of Ni metal nanoparticles, which were introduced in SiO2 by charging-free negative ion implantation of 60 keV. After the oxidation, optical absorption in the visible region, which is due to Ni metal nanoparticles in the specimen, disappears, and a steep absorption edge of insulator NiO appears around ∼4 eV. Simultaneously, the large magnetization of Ni metal nanoparticles changes to a weak magnetization of antiferromagnetic NiO nanoparticles. The nanoparticle formation is confirmed by transmission electron microscopy observation. [ABSTRACT FROM AUTHOR]
- Subjects :
- *METAL ions
*OXIDATION
*NICKEL
*NANOPARTICLES
*OXYGEN
*PHYSICS
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 85
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 14019760
- Full Text :
- https://doi.org/10.1063/1.1769083