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Machining characteristics and mechanism of GO/SiO2 nanoslurries in fixed abrasive lapping.

Authors :
Huang, Shuiquan
Li, Xuliang
Yu, Bowen
Jiang, Zhengyi
Huang, Han
Source :
Journal of Materials Processing Technology. Mar2020, Vol. 277, pN.PAG-N.PAG. 1p.
Publication Year :
2020

Abstract

Water-based slurries with silica (SiO 2) nanoparticles, graphene oxide (GO) nanosheets and GO/SiO 2 hybrid nanostructures as abrasives were synthesised in order to achieve a high-efficiency and low-damage lapping. Tribological characteristics of SiO 2 , GO and GO/SiO 2 nanoslurries were systematically investigated to optimise slurry formulae, and the lubricating mechanisms involved were revealed based on the analyses of worn surfaces and used slurries. Machining performance of the optimised slurries was then examined in the fixed abrasive lapping of glass substrates in terms of surface quality and material removal. The GO/SiO 2 slurry of 0.16 wt.% at a mass ratio of 1:1 generated a lubricating layer consisting of C deposited and SiO 2 dynamic films at the rubbing interface. This improved friction and wear conditions at the contact, producing a significantly lower COF and a better worn surface quality than those slurries containing only GO or SiO 2. The lapping with the GO/SiO 2 slurry thus reduced the surface damage on glass and achieved a crack-free subsurface. In comparison with a conventional lapping, the new lapping process resulted in a 35% reduction in surface roughness, but a 28% increase in material removal rate. Such improvements were attributed to the synergistic lubrication behaviour of the formed nanostructures of GO/SiO 2 in water. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09240136
Volume :
277
Database :
Academic Search Index
Journal :
Journal of Materials Processing Technology
Publication Type :
Academic Journal
Accession number :
139924618
Full Text :
https://doi.org/10.1016/j.jmatprotec.2019.116444