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Atomic oxygen effects on polymers containing silicon or phosphorus: Mass loss, erosion yield, and surface morphology.
- Source :
-
High Performance Polymers . Oct2019, Vol. 31 Issue 8, p969-976. 8p. - Publication Year :
- 2019
-
Abstract
- The differences among polymers containing silicon or phosphorus, 20% polyhedral oligomeric silsesquioxane polyimide (20%-POSS-PI), 30% polysiloxane- block -polyimides (30%-PSX-PI), poly(siloxane imide) homopolymer (PSX-PI), and arylene ether phosphine oxide homopolymer (P-PPO), on mass loss, erosion yield, and surface morphology were elucidated. The tolerance against atomic oxygen (AO) was improved versus Kapton®H after introducing silicon or phosphorus to the polymers. The relative order of the mass loss was PSX-PI < P-PPO < 20%-POSS-PI < 30%-PSX-PI. In contrast, the erosion yields of 30%-PSX-PI, 20%-POSS-PI, and P-PPO decreased by orders of magnitude (PSX-PI declined by about two orders). The surface of Kapton®H was seriously eroded by AO exhibiting a "carpet-like" shape, and the roughness of the surface of Kapton®H became remarkable as the AO fluence increased. PSX-PI, P-PPO, 20%-POSS-PI, and 30%-PSX-PI at an AO fluence of 5.2 × 1020 atoms/cm2 had different surface morphologies, and the relative order of the surface roughness was PSX-PI < 30%-PSX-PI < 20%-POSS-PI < P-PPO. The 30%-PSX-PI and PSX-PI had minor mass losses and a smooth surface. This kind of material might replace inorganic coatings for applications in low earth orbit. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09540083
- Volume :
- 31
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- High Performance Polymers
- Publication Type :
- Academic Journal
- Accession number :
- 138294079
- Full Text :
- https://doi.org/10.1177/0954008318814150