Cite
Improvement in the passivation quality of catalytic-chemical-vapor-deposited silicon nitride films on crystalline Si at room temperature.
MLA
Miyaura, Jun’ichiro, and Keisuke Ohdaira. “Improvement in the Passivation Quality of Catalytic-Chemical-Vapor-Deposited Silicon Nitride Films on Crystalline Si at Room Temperature.” Thin Solid Films, vol. 674, Mar. 2019, pp. 103–06. EBSCOhost, https://doi.org/10.1016/j.tsf.2019.02.006.
APA
Miyaura, J., & Ohdaira, K. (2019). Improvement in the passivation quality of catalytic-chemical-vapor-deposited silicon nitride films on crystalline Si at room temperature. Thin Solid Films, 674, 103–106. https://doi.org/10.1016/j.tsf.2019.02.006
Chicago
Miyaura, Jun’ichiro, and Keisuke Ohdaira. 2019. “Improvement in the Passivation Quality of Catalytic-Chemical-Vapor-Deposited Silicon Nitride Films on Crystalline Si at Room Temperature.” Thin Solid Films 674 (March): 103–6. doi:10.1016/j.tsf.2019.02.006.