Chemical surface analysis on materials and devices under functional conditions – Environmental photoelectron spectroscopy as non-destructive tool for routine characterization.

Highlights • Automated as-is analysis of insulating samples utilizing standalone NAP XPS system. • Environmental Charge Compensation for charge neutralization in NAP XPS. • NAP XPS intrinsic charge compensation on polymers and commercial products. Abstract X-ray photoelectron spectroscopy (XPS) has become a routine analysis method to determine the chemical composition and bonding states of elements of sample surfaces in many industrial applications, like materials development, failure analysis, quality control and device certification. To obtain significant results the analyses of such samples require a fast analysis with reliable quantification and stable data for repeated experiments. In standard XPS experiments under ultrahigh vacuum (UHV) conditions the significance of the results can be affected by changing surface compositions under the analysis conditions, different degrees of degassing and thus changing degrees of differential charging in insulating samples. In this publication the positive influence of XPS analysis under elevated pressures, often named Near-Ambient Pressure XPS or "Environmental XPS" is shown for different samples. Furthermore the process of charge compensation in gas pressures of 1–2 mbar is introduced, followed by a discussion of the perspectives of this "Environmental Charge Compensation". The paper discusses the efficiency and stability of Environmental Charge Compensations for typical insulating test samples, as well as for different bulk insulators. The additional capability of XPS in elevated pressures is demonstrated on a superabsorbent polymer typically used in diapers, showing the difference of the analysis results for its wet and dry state. The paper ends with the example of a commercial printed circuit board demonstrating the power of the method for routine analysis of complete devices. [ABSTRACT FROM AUTHOR]