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X-ray lithography for 3D microfluidic applications

Authors :
Romanato, F.
Tormen, M.
Businaro, L.
Vaccari, L.
Stomeo, T.
Passaseo, A.
Di Fabrizio, E.
Source :
Microelectronic Engineering. Jun2004, Vol. 73/74, p870-875. 6p.
Publication Year :
2004

Abstract

This work addresses the fabrication by X-ray lithography of building block structures for integrated microfluidics. In particular, we demonstrate the realization of a closed microfluidic channel based on a multiple tilted X-ray exposure scheme without the need for registration steps. This scheme is exploited also for the fabrication of metallic 2D vertical gratings that can be used as sieves or electrical detectors in microfluidic channels. Finally, we describe a new process based on the combination of X-ray and e-beam lithography for the realization of flyover channel connecting vertical micro-tank structures. [Copyright &y& Elsevier]

Details

Language :
English
ISSN :
01679317
Volume :
73/74
Database :
Academic Search Index
Journal :
Microelectronic Engineering
Publication Type :
Academic Journal
Accession number :
13432563
Full Text :
https://doi.org/10.1016/S0167-9317(04)00236-9