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X-ray lithography for 3D microfluidic applications
- Source :
-
Microelectronic Engineering . Jun2004, Vol. 73/74, p870-875. 6p. - Publication Year :
- 2004
-
Abstract
- This work addresses the fabrication by X-ray lithography of building block structures for integrated microfluidics. In particular, we demonstrate the realization of a closed microfluidic channel based on a multiple tilted X-ray exposure scheme without the need for registration steps. This scheme is exploited also for the fabrication of metallic 2D vertical gratings that can be used as sieves or electrical detectors in microfluidic channels. Finally, we describe a new process based on the combination of X-ray and e-beam lithography for the realization of flyover channel connecting vertical micro-tank structures. [Copyright &y& Elsevier]
- Subjects :
- *X-ray lithography
*X-rays in industry
*DETECTORS
*ELECTRON beam lithography
Subjects
Details
- Language :
- English
- ISSN :
- 01679317
- Volume :
- 73/74
- Database :
- Academic Search Index
- Journal :
- Microelectronic Engineering
- Publication Type :
- Academic Journal
- Accession number :
- 13432563
- Full Text :
- https://doi.org/10.1016/S0167-9317(04)00236-9