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High performance tunnel field effect transistors based on in-plane transition metal dichalcogenide heterojunctions.

Authors :
Jean Choukroun
Marco Pala
Shiang Fang
Efthimios Kaxiras
Philippe Dollfus
Source :
Nanotechnology. 1/11/2019, Vol. 30 Issue 2, p1-1. 1p.
Publication Year :
2019

Abstract

In-plane heterojunction tunnel field effect transistors based on monolayer transition metal dichalcogenides are studied by means of self-consistent non-equilibrium Green’s functions simulations and an atomistic tight-binding Hamiltonian. We start by comparing several heterojunctions before focusing on the most promising ones, i.e. WTe2-MoS2 and MoTe2-MoS2. The scalability of those devices as a function of channel length is studied, and the influence of backgate voltages on device performance is analyzed. Our results indicate that, by fine-tuning the design parameters, those devices can yield extremely low subthreshold swings (<5 mV/decade) and ION/IOFF ratios higher than 108 at a supply voltage of 0.3 V, making them ideal for ultra-low power consumption. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09574484
Volume :
30
Issue :
2
Database :
Academic Search Index
Journal :
Nanotechnology
Publication Type :
Academic Journal
Accession number :
132927029
Full Text :
https://doi.org/10.1088/1361-6528/aae7df