Back to Search
Start Over
Angle-dependent sputter yield of rippled surfaces.
- Source :
-
Applied Surface Science . Nov2018, Vol. 458, p18-23. 6p. - Publication Year :
- 2018
-
Abstract
- Atomistic (binary-collision) simulation is used to study the sputter yield of rippled C and Si surfaces bombarded with Ar and Ga ions in a wide range of incidence angles and energies. This study was motivated by conflicting theoretical predictions of results when the ion energy is varied. Most simulations refer to a sinusoidal ripple topography with h / λ = 0.05–0.15, where h and λ are the amplitude and wavelength of ripples, respectively. Results are compared with Monte Carlo simulation based on Sigmund’s continuum model of ion sputtering and not tied to a specific ion-target combination. Both types of simulation do not confirm a strong suppression of the angular variation in the sputter yield from rippled surfaces with increasing ion energy, predicted theoretically (Makeev and Barabási, 2004). [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 01694332
- Volume :
- 458
- Database :
- Academic Search Index
- Journal :
- Applied Surface Science
- Publication Type :
- Academic Journal
- Accession number :
- 131199773
- Full Text :
- https://doi.org/10.1016/j.apsusc.2018.07.059