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X-Ray Diffraction Analysis of Features of the Crystal Structure of GaN/Al0.32Ga0.68N HEMT-Heterostructures by the Williamson-Hall Method.

Authors :
Pushkarev, S. S.
Grekhov, M. M.
Zenchenko, N. V.
Source :
Semiconductors. Jun2018, Vol. 52 Issue 6, p734-738. 5p.
Publication Year :
2018

Abstract

The fitting of θ/2θ and ω peaks in X-ray diffraction curves is shown to be most accurate in the case of using an inverse fourth-degree polynomial or probability density function with Student’s distribution (Pearson type VII function). These functions describe well both the highest-intensity central part of the experimental peak and its low-intensity broadened base caused by X-ray diffuse scattering. The mean microdeformation ε and mean vertical domain size D are determined by the Williamson-Hall method for layers of GaN (ε ≈ 0.00006, D ≈ 200 nm) and Al0.32Ga0.68N (ε = 0.0032 ± 0.0005, D = 24 ± 7 nm). The D value obtained for the Al0.32Ga0.68N layer is most likely to result from the nominal thickness of this layer, which is 11 nm. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10637826
Volume :
52
Issue :
6
Database :
Academic Search Index
Journal :
Semiconductors
Publication Type :
Academic Journal
Accession number :
129651852
Full Text :
https://doi.org/10.1134/S1063782618060209