Development of Self‐Heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals.

MLA

Murata, Y. U. K. I., et al. “Development of Self‐Heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals.” Electronics & Communications in Japan, vol. 101, no. 3, Mar. 2018, pp. 96–102. EBSCOhost, https://doi.org/10.1002/ecj.12046.

APA

Murata, Y. U. K. I., Han, G. A. N. G., Ohkawa, D. A. I. K. I., Imai, J. U. N. I. C. H. I., Sohgawa, M. A. S. A. Y. U. K. I., & Abe, T. A. K. A. S. H. I. (2018). Development of Self‐Heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals. Electronics & Communications in Japan, 101(3), 96–102. https://doi.org/10.1002/ecj.12046

Chicago

Murata, Y. U. K. I., G. A. N. G. Han, D. A. I. K. I. Ohkawa, J. U. N. I. C. H. I. Imai, M. A. S. A. Y. U. K. I. Sohgawa, and T. A. K. A. S. H. I. Abe. 2018. “Development of Self‐Heated Stage Suitable for Thermal Assist Reactive Ion Etching of the Functional Metals.” Electronics & Communications in Japan 101 (3): 96–102. doi:10.1002/ecj.12046.