Cite
Electrical characterization of ALD HfO2 high-k dielectrics on (201) β-Ga2O3.
MLA
Shahin, David I., et al. “Electrical Characterization of ALD HfO2 High-k Dielectrics on (201) β-Ga2O3.” Applied Physics Letters, vol. 112, no. 4, Jan. 2018, p. 1–N.PAG. EBSCOhost, https://doi.org/10.1063/1.5006276.
APA
Shahin, D. I., Tadjer, M. J., Wheeler, V. D., Koehler, A. D., Anderson, T. J., Eddy, C. R., & Christou, A. (2018). Electrical characterization of ALD HfO2 high-k dielectrics on (201) β-Ga2O3. Applied Physics Letters, 112(4), 1–N.PAG. https://doi.org/10.1063/1.5006276
Chicago
Shahin, David I., Marko J. Tadjer, Virginia D. Wheeler, Andrew D. Koehler, Travis J. Anderson, Charles R. Eddy, and Aris Christou. 2018. “Electrical Characterization of ALD HfO2 High-k Dielectrics on (201) β-Ga2O3.” Applied Physics Letters 112 (4): 1–N.PAG. doi:10.1063/1.5006276.