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Fabrication of three-dimensional microstructures in positive photoresist through two-photon direct laser writing.
- Source :
-
Applied Physics A: Materials Science & Processing . Aug2017, Vol. 123 Issue 8, p1-7. 7p. - Publication Year :
- 2017
-
Abstract
- Three-dimensional (3D) microstructures with micron scale are fabricated in photoresist using two-photon direct laser writing with an infrared femtosecond laser at 800 nm. The positive photoresist of Novolak/diazonaphthoquinone (DNQ) is used for the fabrication of line structures and 3D microstructures. Linewidths of line structures are fabricated with laser power ranging from 1 to 15 mW and scanning speeds ranging from 5 to 50 μm s. The obtained linewidth is analyzed using an exposure kinetics model of DNQ for two-photon absorption. Both 3D inversed woodpile structures and helical structures are fabricated. Graphical abstract: Two-photon direct laser writing is used to fabricate microstructures in positive photoresist. Microstructures with helical and inversed woodpile shapes were fabricated with positive photoresist Novolak/DNQ using two-photon direct laser writing. [ABSTRACT FROM AUTHOR]
- Subjects :
- *PHOTORESISTS
*MICROELECTRONICS
*ELECTRON resists
*FEMTOSECOND lasers
*LASERS
Subjects
Details
- Language :
- English
- ISSN :
- 09478396
- Volume :
- 123
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- Applied Physics A: Materials Science & Processing
- Publication Type :
- Academic Journal
- Accession number :
- 124728161
- Full Text :
- https://doi.org/10.1007/s00339-017-1170-4