Electron interference effects and strong localization in Cu doped ZnO thin films.

MLA

Das, Amit K., et al. “Electron Interference Effects and Strong Localization in Cu Doped ZnO Thin Films.” Materials Science in Semiconductor Processing, vol. 68, Sept. 2017, pp. 275–78. EBSCOhost, https://doi.org/10.1016/j.mssp.2017.06.024.

APA

Das, A. K., Misra, P., Ajimsha, R. S., Sahu, V. K., & Singh, B. (2017). Electron interference effects and strong localization in Cu doped ZnO thin films. Materials Science in Semiconductor Processing, 68, 275–278. https://doi.org/10.1016/j.mssp.2017.06.024

Chicago

Das, Amit K., P. Misra, R.S. Ajimsha, V.K. Sahu, and B. Singh. 2017. “Electron Interference Effects and Strong Localization in Cu Doped ZnO Thin Films.” Materials Science in Semiconductor Processing 68 (September): 275–78. doi:10.1016/j.mssp.2017.06.024.