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Effect of disorder on the resistivity of CoFeCrAl films.

Authors :
Jin, Y.
Skomski, R.
Kharel, P.
Valloppilly, S. R.
Sellmyer, D. J.
Source :
AIP Advances. 2017, Vol. 7 Issue 5, p1-6. 6p.
Publication Year :
2017

Abstract

Structural and electron-transport properties of thin films of the ferrimagnetic Heusler compound CoFeCrAl have been investigated to elucidate structure-property relationships. The alloy is, ideally, a spin-gapless semiconductor, but structural disorder destroys the spin-gapless character and drastically alters the transport behavior. Two types of CoFeCrAl films were grown by magnetron sputtering deposition at 973 K, namely polycrystalline films on Si substrates and epitaxial films on MgO (001) substrates. The resistivity decreases with increasing temperature, with relatively small temperature coefficients of -0.19 μΩcm/KμΩcm/K for the polycrystalline films and -0.12 μΩcm/KμΩcm/K for the epitaxial films. The residual resistivity of the polycrystalline films deposited on Si is higher than that of the epitaxial film deposited on MgO, indicating that the polycrystalline films behave as so-called dirty metals. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
21583226
Volume :
7
Issue :
5
Database :
Academic Search Index
Journal :
AIP Advances
Publication Type :
Academic Journal
Accession number :
123413556
Full Text :
https://doi.org/10.1063/1.4978591