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Hybrid formation of graphene oxide–POSS and their effect on the dielectric properties of poly(aryl ether ketone) composites.
- Source :
-
New Journal of Chemistry . 4/21/2017, Vol. 41 Issue 8, p3089-3096. 8p. - Publication Year :
- 2017
-
Abstract
- An effective method was proposed to prepare low dielectric constant composites based on a hybrid of graphene oxide–POSS and fluoropoly(ether ether ketone) (FPEEK). Through the formation of amide between aminopropylisobutyl polyhedral oligomeric silsesquioxane (POSS-NH2) and oxygen-containing groups (carboxyl groups) on graphene oxide (GO), the covalent functionalization of GO with POSS-NH2 (POSS-NH2–GO) hybrid was carried out, which is highly soluble in many organic solvents. The structure of the POSS-NH2–GO hybrid was confirmed by FT-IR, Raman, XRD, TGA, XPS, and TEM. The POSS-NH2–GO hybrid was well dispersed within the FPEEK polymer matrix to prepare POSS-NH2–GO/FPEEK composite films by solution blending. The dielectric constants of the composites decreased with the increasing content of POSS-NH2–GO hybrid, and a κ value of 2.01 was achieved with the incorporation of the hybrid, only 3.0 wt% could cause a 92.8% high enhancement in Young's modulus. [ABSTRACT FROM AUTHOR]
- Subjects :
- *GRAPHENE oxide
*SILICONES
*POLYARYLETHERS
Subjects
Details
- Language :
- English
- ISSN :
- 11440546
- Volume :
- 41
- Issue :
- 8
- Database :
- Academic Search Index
- Journal :
- New Journal of Chemistry
- Publication Type :
- Academic Journal
- Accession number :
- 122414041
- Full Text :
- https://doi.org/10.1039/c6nj03802f