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Mask makers contemplate the next generation.

Authors :
Jones-Bey, Hassaun A.
Source :
Laser Focus World. Nov2003, Vol. 39 Issue 11, p41-44. 3p.
Publication Year :
2003

Abstract

Highlights the SPIE symposium on photomask technology held last September in Monterey, California. Topics discussed during the symposium; Organizers of the event; Attendees.

Subjects

Subjects :
*CONFERENCES & conventions
*COMPUTER software
*OPTICS
*OPTOELECTRONICS

Details

Language :
English
ISSN :
10438092
Volume :
39
Issue :
11
Database :
Academic Search Index
Journal :
Laser Focus World
Publication Type :
Periodical
Accession number :
11542430

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Authors Abstract Subjects Details