Cite
Exposure strategy and crystallization of Ge-Sb-Te thin film by maskless phase-change lithography.
MLA
Ri Wen Ni, et al. “Exposure Strategy and Crystallization of Ge-Sb-Te Thin Film by Maskless Phase-Change Lithography.” Optical Engineering, vol. 54, no. 4, Apr. 2015, pp. 1–7. EBSCOhost, https://doi.org/10.1117/1.OE.54.4.045103.
APA
Ri Wen Ni, Bi Jian Zeng, Jun Zhu Huang, Teng Luo, Zhen Li, & Xiang Shui Miao. (2015). Exposure strategy and crystallization of Ge-Sb-Te thin film by maskless phase-change lithography. Optical Engineering, 54(4), 1–7. https://doi.org/10.1117/1.OE.54.4.045103
Chicago
Ri Wen Ni, Bi Jian Zeng, Jun Zhu Huang, Teng Luo, Zhen Li, and Xiang Shui Miao. 2015. “Exposure Strategy and Crystallization of Ge-Sb-Te Thin Film by Maskless Phase-Change Lithography.” Optical Engineering 54 (4): 1–7. doi:10.1117/1.OE.54.4.045103.