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Nanostructured alumina films by E-beam evaporation.
- Source :
-
Ceramics International . Nov2015 Part A, Vol. 41 Issue 9, p10537-10546. 10p. - Publication Year :
- 2015
-
Abstract
- The E-beam evaporation technique is utilised at room temperature to deposit 90, 120 and 150 nm thin alumina films on 75 μm thin titanium foils. As-grown films are annealed at 500, 700 and 800 °C in air. The phase analysis, morphology and electronic structure of the as-grown and annealed thin films are respectively investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and X-ray photoelectron spectroscopy (XPS) techniques. The XRD results show that the as-grown thin films are amorphous. The annealed thin films show crystalline peaks corresponding to a mixture of different phases of alumina. The FESEM studies reveal tripod-like nanostructure and dense nanorods in the alumina thin films annealed at 700 and 800 °C, respectively. These results are explained on the basis of experimental evidences provided by the corresponding XPS studies. [ABSTRACT FROM AUTHOR]
- Subjects :
- *ALUMINUM oxide films
*ELECTRON beams
*EVAPORATION (Chemistry)
*VAPORS
*THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 02728842
- Volume :
- 41
- Issue :
- 9
- Database :
- Academic Search Index
- Journal :
- Ceramics International
- Publication Type :
- Academic Journal
- Accession number :
- 108456041
- Full Text :
- https://doi.org/10.1016/j.ceramint.2015.04.147