Promoting inter-diffusion behavior of Co/Si (100) films by high magnetic field annealing.

MLA

Wang, Kai, et al. “Promoting Inter-Diffusion Behavior of Co/Si (100) Films by High Magnetic Field Annealing.” Vacuum, vol. 116, June 2015, pp. 110–14. EBSCOhost, https://doi.org/10.1016/j.vacuum.2015.03.013.

APA

Wang, K., Zhao, Y., Wang, Q., Li, G., Pang, H., & He, J. (2015). Promoting inter-diffusion behavior of Co/Si (100) films by high magnetic field annealing. Vacuum, 116, 110–114. https://doi.org/10.1016/j.vacuum.2015.03.013

Chicago

Wang, Kai, Yue Zhao, Qiang Wang, Guojian Li, Hongxuan Pang, and Jicheng He. 2015. “Promoting Inter-Diffusion Behavior of Co/Si (100) Films by High Magnetic Field Annealing.” Vacuum 116 (June): 110–14. doi:10.1016/j.vacuum.2015.03.013.