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Elucidation of the degradation pathways of sulfonamide antibiotics in a dielectric barrier discharge plasma system.

Authors :
Kim, Kil-Seong
Kam, Sang Kyu
Mok, Young Sun
Source :
Chemical Engineering Journal. Jul2015, Vol. 271, p31-42. 12p.
Publication Year :
2015

Abstract

The degradation of sulfonamide antibiotics, such as sulfathiazole (STZ), sulfamethazine (SMT) and sulfamethoxazole (SMZ) in water was carried out with a nonthermal dielectric barrier discharge plasma reactor operating under dry air or oxygen. In order to understand the degradation pathways of the antibiotics, the plasma-treated aqueous antibiotic solutions were characterized by various techniques such as UV–visible spectroscopy, ion chromatography, liquid chromatography coupled to a tandem mass spectrometer (LC–MS/MS), pH and electrical conductivity measurements, and total organic carbon analysis. The degradation rates of the antibiotics investigated were found to be higher with pure oxygen than with dry air, and decreased in the order: SMT > STZ > SMZ. As the degradation proceeded, the characteristic absorption peaks gradually decreased and the solution pH and conductivity increased, indicating that the antibiotics were being mineralized. The ion chromatography identified both inorganic (SO 4 2 − , NO 3 − and NH 4 + ) and organic ions (acetate, formate and oxalate) as the stable degradation products. After 60-min plasma treatment with oxygen, the percentage of the S atoms transformed into SO 4 2 − was in the range of 66.9–86.4%, depending upon the type of antibiotics, while of the percentage of the N atoms transformed into NH 4 + and NO 3 − was in the range of 15.7–33.2%. The possible degradation pathways of the antibiotics were proposed from the identified intermediate products formed during the degradation, which elucidates that the hydroxylation of the ring structures in the antibiotic molecules initiates the degradation. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
13858947
Volume :
271
Database :
Academic Search Index
Journal :
Chemical Engineering Journal
Publication Type :
Academic Journal
Accession number :
101910967
Full Text :
https://doi.org/10.1016/j.cej.2015.02.073