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Thin Films of Molybdenum Disulfide Doped with Chromiumby Aerosol-Assisted Chemical Vapor Deposition (AACVD).

Authors :
DavidJ. Lewis
Aleksander A. Tedstone
Xiang Li Zhong
Edward A. Lewis
Aidan Rooney
Nicky Savjani
Jack R. Brent
Sarah J. Haigh
M. Grace Burke
Christopher A. Muryn
James M. Raftery
Chris Warrens
Kevin West
Sander Gaemers
Paul O’Brien
Source :
Chemistry of Materials. Feb2015, Vol. 27 Issue 4, p1367-1374. 8p.
Publication Year :
2015

Abstract

A combined single-source precursorapproach has been developedfor the deposition of thin films of Cr-doped molybdenum disulfide(MoS2) by aerosol-assisted chemical vapor deposition (AACVD).Tris(diethyldithiocarbamato)chromium(III) can also be used for thedeposition of chromium sulfide (CrS). Films have been analyzed bya range of techniques including scanning electron microscopy (SEM),energy dispersive X-ray (EDX) spectroscopy, Raman spectroscopy, andpowder X-ray diffraction (pXRD) to elucidate film morphology, composition,and crystallinity. The presence of Cr in the MoS2filmsproduces a number of striking morphological, crystallographic, andnanomechanical changes to the deposited films. The chromium dopantappears to be uniform throughout the MoS2from the scanningtransmission electron microscopy (STEM) EDX spectrum imaging of nanosheetsproduced by liquid-phase exfoliation of the thin films in N-methyl-2-pyrollidone. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
08974756
Volume :
27
Issue :
4
Database :
Academic Search Index
Journal :
Chemistry of Materials
Publication Type :
Academic Journal
Accession number :
101146890
Full Text :
https://doi.org/10.1021/cm504532w