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Performances Enhancement of H-Doped ZnO Nanorods by H2/Ar Plasma Treatment.

Authors :
Wang, Ruey‐Chi
Cheng, Chiao‐Fang
Source :
Plasma Processes & Polymers. Jan2015, Vol. 12 Issue 1, p51-58. 8p.
Publication Year :
2015

Abstract

The thermal stability of H dopants in ZnO nanorod (NR) array is demonstrated to be greatly enhanced by a H2/Ar mixed plasma treatment compared to a H2 plasma treatment and hence their optoelectronic properties. For all the as-treated samples with the plasma containing H2 plasma, ultraviolet emission and electrical conductivity are enhanced as well as sensitivity and photoresponsivity of UV sensing. Notably, only the H2/Ar-treated samples show high thermal stability of H dopants and enhanced optoelectronic properties after annealing at 300 °C for 1 h, which is attributed to the assistance of Ar plasma. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
16128850
Volume :
12
Issue :
1
Database :
Academic Search Index
Journal :
Plasma Processes & Polymers
Publication Type :
Academic Journal
Accession number :
100420440
Full Text :
https://doi.org/10.1002/ppap.201400056