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Ion Implantation in Silicon Technology.
- Source :
-
Industrial Physicist . Jun/Jul2003, Vol. 9 Issue 3, p12. 4p. - Publication Year :
- 2003
-
Abstract
- Discusses the importance of ion implantation in silicon technology to integrated-circuit (IC) manufacturing. Features of ion implantation technique; Details for dose and energy requirement of major implantation applications; Need for IC designers to reduce implanter-induced contamination; Share of major IC manufacturers of ion implantation equipment in the market.
Details
- Language :
- English
- ISSN :
- 10821848
- Volume :
- 9
- Issue :
- 3
- Database :
- Academic Search Index
- Journal :
- Industrial Physicist
- Publication Type :
- Academic Journal
- Accession number :
- 10005379