1. Misorientation increase of small-angle grain boundaries during directional solidification of silicon.
- Author
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Chuang, Lu-Chung, Maeda, Kensaku, Nozawa, Jun, Morito, Haruhiko, and Fujiwara, Kozo
- Subjects
- *
DIRECTIONAL solidification , *CRYSTAL grain boundaries , *DISLOCATION density , *ABSORPTION , *SILICON - Abstract
• Small-angle grain boundaries (SAGB) form spontaneously by dislocation aggregation during solidification of Si at a high dislocation density. • The critical density for SAGB formation was found as ca. 107 cm-2. • SAGBs tend to coalesce with other SAGBs to leave the surviving SAGBs with higher misorientation. • SAGBs are able to spontaneously increase their misorientation by absorption of individual lattice dislocations during solidification. In situ observation of the solidification process of Si combined with ex situ characterization revealed that small-angle grain boundaries (SAGBs) increase misorientation through two paths. First, coalescence with other SAGBs leads to a boost in misorientation and SAGBs tend to coalesce during solidification. Second, the absorption of individual lattice dislocations also increases the misorientation of an SAGB. Three possible mechanisms behind dislocation absorption by SAGBs have been proposed and are discussed in this paper. Among these mechanisms, the incorporation of same-sign lattice dislocations is regarded as the prominent mechanism when misorientation increases during solidification. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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