1. TCAD Simulation of an E-Mode Heterojunction Bipolar p-FET with I max > 240 mA/mm.
- Author
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Zhang, Wenqian, Ge, Mei, Li, Yi, Tan, Shuxin, Yu, Chenhui, and Chen, Dunjun
- Subjects
HETEROJUNCTION bipolar transistors ,HOLE mobility ,BIPOLAR transistors ,THERMAL stability ,HETEROJUNCTIONS - Abstract
This work demonstrates an enhancement mode heterojunction bipolar p-FET (HEB-PFET) structure with a AlGaN/GaN heterojunction bipolar transistor (HBT) integrated on the drain side. Such device design notably contributes to the ultra-high output current density, which is conventionally limited by the low hole mobility and concentration in the p-FETs. The HEB-PFET exhibits an output current density of 241 mA/mm, which is 134 times larger compared to the conventional p-FET (C-PFET) and 2.4 times of the homojunction bipolar p-FET (HOB-PFET). This can be attributed to a better current gain of HBT than homojunction bipolar transistor (BJT). An optimized HEB-PFET of 6 nm p-GaN layer beneath the gate is proposed, where I
ON /IOFF is >1011 , and Vth is −0.44 V. Additionally, thermal stabilities are studied with temperature changes from 300 K to 425 K. Moreover, a semi-empirical compact model is presented to visually explain the working principle of the HEB-PFET. [ABSTRACT FROM AUTHOR]- Published
- 2024
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