1. Structural and Electrical Characterization of Solution‐Deposited β‐Ga2O3:Al.
- Author
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Muramba, Valentine W., Ali, Abdulraoof I. A., and Nel, Jacqueline M.
- Subjects
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WIDE gap semiconductors , *SEMICONDUCTOR thin films , *SCHOTTKY barrier , *THIN films , *SPIN coating - Abstract
The wide bandgap oxide semiconductor thin films are synthesized using tetrahydroxogallate (III) ammonium {NH4Ga(OH)4} precursor at a concentration of 10 at% Ga and varying amounts of hydrated aluminum nitrate between 0.6 and 3.2 at%. Thin films of β‐Ga2O3:Al are synthesized by spin coating and spray pyrolysis with postannealing in nitrogen ambient at 930 °C. The structural properties of the thin films are investigated using XRD and Raman spectroscopy, while the electrical characteristics are determined using 4‐point probe, current–voltage (
I–V ), and capacitance–voltage (C–V ) measurements with Ti/Al/Ni/Au Ohmic contacts and Pd/Au Schottky contacts. The β‐Ga2O3 with 2.2 at% Al is found to be the optimal concentration in this study, resulting in ideality factors of 1.10 and 1.09, saturation currents of 3.17 × 10−6 and 3.10 × 10−6 A, Schottky barrier heights of 0.73 and 0.88 eV, and series resistances of 948 and 955 Ω, for the spin‐coated and pyrolytically sprayed samples respectively. [ABSTRACT FROM AUTHOR]- Published
- 2024
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