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The resolution of current patterning technologies is insufficient for applications in advanced devices. We show a femtosecond laser regulatory focus ablation patterning technique for fluorescent films at up to 1/10 the scale of the diffraction limit.

Metal halide perovskites have exhibited promising potential for practical applications such as image sensors and displays benefiting from their outstanding optoelectronic properties. However, owing to the instability of the perovskite materials, producing patterned perovskite films with adequately high quality and high precision for such practical applications poses a challenge for existing patterning methods. Herein, the lamination-assisted femtosecond laser ablation (LA-FsLA) technique was successfully applied to fabricate patterned CsPbBr