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We propose a specifically designed structure to fabricate thin-film transistors using amorphous indium-gallium-zinc-oxide (a-IGZO) films as the active channel layers. The I-shaped gate electrode is employed to define the channel width, reducing overlaps between the gate and source/drain electrodes. The devices with such a structure exhibit acceptable electrical performance and stability after annealing treatment. The XPS data show that the as-deposited a-IGZO film has not a very dense structure that may induce shallow traps. A shallow trap model is proposed to explain the large threshold voltage shifts of the as-deposited device. Annealing treatment can eliminate these shallow traps and improve the device stability. [ABSTRACT FROM AUTHOR]

Temperature-dependent photoluminescence (PL) spectroscopy is employed to investigate the effects of exposure to ambient air on the optical property of Al-doped ZnO nanorods. Low temperature PL of the as-grown nanorods shows dominant D0X (excitons bound to neutral donors) emission at 3.363 eV and surface state-related emission at 3.310 eV. After exposure to ambient air, both of them vanish and the first LO phonon replica of free exciton is observed instead. It is proposed that surface adsorption and indiffusion of oxygen in ambient air result in surface modification and destruction of D0X complex. [ABSTRACT FROM AUTHOR]

P-doped p-type ZnO thin films have been grown by metalorganic chemical vapor deposition. By modulating the P evaporating temperature, p-type conductivity can be controlled due to the different P content incorporated into the ZnO films. The P-doped p-type ZnO thin films are of high optical quality, as indicated by low-temperature photoluminescence. P-related acceptor state with an energy level of 163 meV is identified from free-to-neutral-acceptor transitions. In addition, x-ray photoelectron spectroscopy confirms that only one chemical bonding state of P exists in the P-doped ZnO thin films. [ABSTRACT FROM AUTHOR]

Temperature-dependent photoluminescence excitation (PLE) spectroscopy is used to study nominally undoped and indium-doped ZnO nanorods grown by thermal evaporation method. Clear differences in PLE features between the two samples are observed. We demonstrate that the first derivative of the PLE spectra can be used to determine the free exciton energy for both samples. The physics behind is understood either in terms of competing absorption and recombination to the green emission band being monitored, or based on the analogy between the first derivative of PLE and photoreflectance spectroscopy. Two residual donor levels located at about 37 and 120 meV below the conduction band minimum are identified from the PLE spectra. [ABSTRACT FROM AUTHOR]

Al-doped ZnO (AZO) thin films have been prepared by mist chemical vapor deposition and magnetron sputtering. The band gap shift as a function of carrier concentration in n-type zinc oxide (ZnO) was systematically studied considering the available theoretical models. The shift in energy gap, evaluated from optical absorption spectra, did not depend on sample preparations; it was mainly related to the carrier concentrations and so intrinsic to AZO. The optical gap increased with the electron concentration approximately as ne2/3 for ne≤4.2×1019 cm-3, which could be fully interpreted by a modified Burstein–Moss (BM) shift with the nonparabolicity of the conduction band. A sudden decrease in energy gap occurred at 5.4-8.4×1019 cm-3, consistent with the Mott criterion for a semiconductor-metal transition. Above the critical values, the band gap increased again at a different rate, which was presumably due to the competing BM band-filling and band gap renormalization effects, the former inducing a band gap widening and the latter an offsetting narrowing. The band gap narrowing (ΔEBGN) derived from the band gap renormalization effect did not show a good ne1/3 dependence predicated by a weakly interacting electron-gas model, but it was in excellent agreement with a perturbation theory considering different many-body effects. Based on this theory a simple expression, ΔEBGN=Ane1/3+Bne1/4+Cne1/2, was deduced for n-type ZnO, as well as p-type ZnO, with detailed values of A, B, and C coefficients. An empirical relation once proposed for heavily doped Si could also be used to describe well this gap narrowing in AZO. [ABSTRACT FROM AUTHOR]

(Zn,Al)O thin films have been prepared by a dc reactive magnetron sputtering system with the Al contents in a wide range of 0–50 at. %. The structural, optical, and electrical properties of (Zn,Al)O films were detailedly and systematically studied. The amount of Al in the film was nearly the same as, but often lower than, that in the sputtering target. The growth rate of films monotonically decreased as the Al content increased. In a low Al content region (<10 at. %), Al-doped ZnO (AZO) thin films could be obtained at 400 °C in an Ar–O2 ambient with good properties. The optimal results of n-type AZO films were obtained at an Al content of 4 at. %, with low resistivity ∼10-4 Ω cm, high transmittance ∼90% in the visible region, and acceptable crystal quality with a high c-axis orientation. The band gap could be widened to 3.52 eV at 4 at. % Al due to the Burstein-Moss shift [E. Burstein, Phys. Rev. 93, 632 (1954)] modulated by many-body effects. An appropriate Al-doping concentration served effectively to release the residual, compressive stress in film, which may be the reason for the improvement in film stability and the increment in grain size as well. In a medium Al content region (10–30 at. %), however, the film quality was degraded, which was presumably due to the formation of clusters or precipitates in the grains and boundaries. Besides the (002) plane, other diffraction peaks such as (100) and (101) planes of ZnO were observed, but the (Zn,Al)O films still exhibited a single-phase wurtzite ZnO structure. An intragrain cluster scattering mechanism was proposed to interpret the reduction of carrier mobility in films with the Al contents in the 7–20 at. % region. The solubility limit of Al in ZnO film was identified to be in the 20–30 at. % range, much higher than the thermodynamic solubility limit of 2–3 at. % in ZnO. In a high Al content region (>=30 at. %), there were distinct observations for (Zn,Al)O films. As the Al content was 30 at. %, the film appeared in a two-phase nature with ZnO hexagonal and Al2O3 rhombohedral structures. At the 50 at. % Al content, the matrix of the (Zn,Al)O film was Al2O3, and no evident trace of wurtzite ZnO was observed. The electrical and optical properties for both cases were also very different from those at the Al contents below 30 at. %. [ABSTRACT FROM AUTHOR]

The dependence of lattice strain in Al-N codoped p-type ZnO films on Al content and growth temperature was investigated. With increasing Al content, the compressive strain in the film first increases and then decreases. We suggest that the strain decrease is due to the occupation of more substitutional sites by Al at relatively high Al content, which partially compensates the compressive strain. Reversion of conduction type at high Al content and high temperature was also observed. By studying the strain and electrical properties of the codoped films, we conclude that ZnO film should be grown at intermediate temperatures and with low Al content to achieve both good p-type conduction and reasonable crystal quality. The compressive strain results in increase of the optical band gap, and a linear relationship between them was obtained. [ABSTRACT FROM AUTHOR]