97 results on '"Zaitsev, S. I."'
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2. Energy and Transport Lengths for Describing Volume of Resist Modification in Ion-Beam Lithography
3. Organic Resist Contrast Determination in Ion Beam Lithography
4. A Confocal Collimator for Radionuclide Diagnostics and X-Ray Fluorescence Analysis
5. Complex investigations of effects of charging a polymer resist (PMMA) during electron lithography
6. Comparison of the efficiency of 63Ni beta-radiation detectors made from silicon and wide-gap semiconductors
7. Simulation of e-beam penetration through multilayer structures
8. The development of the TRAP-97 software system. A sensitivity analysis
9. Improvement of the TRAP-97 computational system. Taking into consideration spatial effects in the reactor
10. Verification of the TECh'-M-97 program on the basis of experimental results obtained for a large leak on a large-scale stand with nuclear heating
11. Laser ion beam formation for nanotechnologies
12. EBIC measurements of small diffusion length in semiconductor structures
13. Simulation of the fluctuations of energy and charge deposited during e-beam exposure
14. Verification of three-dimensional neutron kinetics model of TRAP-KS code regarding reactivity variations
15. Model of fracture of composite material with brittle fiber
16. The propagation in moving media of signals generated by sources distributed over a plane
17. Field of a constant electric dipole in a moving plasma
18. Some characteristics of stabilization of radiation in a moving isotropic plasma
19. Problem of reception of signals from a moving source in a plasma
20. Problem of establishment of radiation field of a source moving in magnetized plasma
21. Wave radiation by an oscillating electric dipole in a moving “warm” plasma
22. Enlargement of the Assessment Database for Advanced Computer Codes in Relation to the VVER Technology: Benchmark on LB-LOCA Transient in PSB-VVER Facility – final results
23. Enlargement of the Assessment Database for Advanced Computer Codes in relation to the VVER Technology: Benchmark on LB-LOCA Transient in PSB-VVER Facility
24. The Movement of Double-Ended Dislocation Arrays
25. Validation of Advanced Computer Codes for VVER Technology: LB-LOCA Transient in PSB-VVER Facility
26. Viscosity measurement of nanoimprint lithography resists with a rheological nanoindenter
27. Simulation of electron scattering in thin films using Monte-Carlo method in discrete looses approximation
28. Current density and exposure sequence effect in electron lithography
29. Modeling of dielectric polarization during an electron beam exposure
30. Electron beam with homogeneous solids interaction simulation using Monte-Carlo method in discrete looses approximation
31. Numerical simulation of the signal formation in a scanning electron microscope with remote electrodes
32. Computation of charge and energy deposited during electron beam irradiation depth distributions in discrete looses approximation.
33. An investigation of the rate of Si self-interstitial annihilation at dislocations
34. Characterisation of surface flatness by the backscattered electron coefficient
35. RECENT STATE OF THE THEORY OF THE METHODS OF INDUCED CONCENTRATION
36. COMPUTER PROCESSING OF EBIC SIGNALS
37. Comparison of a simple model of BSE signal formation and surface reconstruction with monte carlo calculations
38. Signal formation of backscattered electrons by microinhomogeneities and surface relief in a SEM
39. One particularity of energy-angular secondary electrons spectrum.
40. Determination of subsurface structure parameters of a sample using secondary electrons energy spectrums.
41. Energy dependence of proximity parameters investigated by fitting before measurement tests.
42. Accuracy of proximity correction in electron lithography after development.
43. The first synthetic X-ray hologram: results
44. Simulation of recombination contrast of extended defects in the modulated EBIC
45. Three-dimensional design in electron-beam lithography.
46. Dose contribution of heating in electron-beam lithography.
47. Deformation and viscouse flow in nano-imprinting
48. The movement of double-ended dislocation arrays through discrete obstacles
49. The movement of double-ended dislocation arrays
50. Robin Hood as self-organized criticality
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