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Fabrication-induced imperfections in photonic wire waveguides, such as roughness, stitching errors, and discontinuities, degrade their performance and thereby lower the yield of large-scale systems. This degradation is primarily due to the high insertion losses induced by imperfections, which scale nonlinearly with the index contrast in wire waveguides. Here we investigate the influence of discontinuities in photonic waveguides and later show a platform that is robust to fabrication imperfections. Our platform is based on an array of silicon nano-pillars, arranged to form a sub-wavelength (SW) grating waveguide. We focus on investigating the robustness by considering an abrupt break in the waveguide, as an extreme case of discontinuity. We show that sub-wavelength silicon waveguides are robust against unwanted large discontinuities relative to the operating wavelength. We measure a transmission loss of <2.2 dB at 1550 n m , for a discontinuity of length 2.1 μ m , when compared to more than 7 d B of loss in conventional silicon wire waveguides for the same discontinuity. Our results show that this mode of protection is broadband, covering the entire telecommunication band (λ =1500-1600 nm). We believe that this investigation of the influence of discontinuities in photonic waveguides could be a step toward the realization of low-loss optical waveguides.

Compact beam steering in the visible spectral range is required for a wide range of emerging applications, such as augmented and virtual reality displays, optical traps for quantum information processing, biological sensing, and stimulation. Optical phased arrays (OPAs) can shape and steer light to enable these applications with no moving parts on a compact chip. However, OPA demonstrations have been mainly limited to the near-infrared spectral range due to the fabrication and material challenges imposed by the shorter wavelengths. Here, we demonstrate the first chip-scale phased array operating at blue wavelengths (488 nm) using a high-confinement silicon nitride platform. We use a sparse aperiodic emitter layout to mitigate fabrication constraints at this short wavelength and achieve wide-angle beam steering over a 50° field of view with a full width at half-maximum beam size of 0.17°. Large-scale integration of this platform paves the way for fully reconfigurable chip-scale three-dimensional volumetric light projection across the entire visible range.

Current silicon photonics phased arrays based on waveguide gratings enable beam steering with no moving parts. However, they suffer from a trade-off between beam divergence and field of view. Here, we show a platform based on silicon-nitride/silicon that achieves simultaneously minimal beam divergence and maximum field of view while maintaining performance that is robust to fabrication variations. In addition, in order to maximize the emission from the entire length of the grating, we design the grating's strength by varying its duty cycle (apodization) to emit uniformly. We fabricate a millimeter long grating emitter with diffraction-limited beam divergence of 0.089°.

We designed and fabricated Ge/Si avalanche photodiodes grown on silicon substrates. The mesa-type photodiodes exhibit a responsivity at 1310 nm of 0.54 A/W, a breakdown voltage thermal coefficient of 0.05%/ degrees C, a 3 dB-bandwidth of 10 GHz. The gain-bandwidth product was measured as 153 GHz. The effective k value extracted from the excess noise factor was 0.1.