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11. Room temperature fabrication Oxide TFT with Y2O3 as a gate oxide and Mo contact

Author

Bobade, Santosh M., Shin, Ji-Hoon, Cho, Young-Je, You, Jung-Sun, and Choi, Duck-Kyun

Subjects
*MICROFABRICATION, *THIN film transistors, *SEMICONDUCTORS, *METALLIC oxides, *YTTRIUM, *MOLYBDENUM, *LOW voltage systems, *TEMPERATURE
Abstract

Abstract: In this investigation, an operating voltage as low as 5V has been achieved for Oxide TFT with Y2O3 as a gate oxide and a-IGZO as an active layer. The OTFT has been fabricated at room temperature using RF sputter. The mobility and threshold voltages are 11.3cm2/Vs and 3.4V for the device with W/L =0.8, respectively. The annealing at 400°C in N2 containing 5% H2 ambient has been utilized to improve the electrical performance of TFT. The on–off current which is determined by gate dielectric has been observed to be 104. It has also been observed that the dielectric properties of gate oxide deteriorate on annealing. The dielectric constant of Y2O3 is observed in the range between 5.1 and 5.4 measured on various devices. [Copyright &y& Elsevier]

Published
2009
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