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Both the United States and South Korea have implemented publicly funded long-term care programs intended to cope with the rapid aging of their populations. These programs provide market-based solutions that depend on cheap labor supplied by women from marginalized groups. Drawing upon comparative ethnographic data collected in Los Angeles’ Koreatown and Seoul, this study illuminates the mechanisms by which publicly funded long-term care programs systematically devalue care through a combination of state policy and racialized labor markets. These programs not only sort and channel marginalized women into the low-paid care sector through targeted forms of recruitment, but they also do so by promoting an idealized care worker subject. However, workers do not passively accept their subjectivation. Instead, they selectively choose to embody some aspects of the imposed idealized care worker subject to help navigate their precarious working conditions. In doing so, they give meaning to their work and thus empower themselves.

This article examines how state eldercare provision influences care workers’ subjectivities and claims for dignity and self-worth. Drawing upon extensive fieldwork conducted in South Korea, I argue that migrant and native-born care workers construct different ideals around what is “good” versus “bad” care through the marking of ethnic and professional boundaries. South Korean women employed as state-certified care workers emphasize the expertise and skill they provide as professional caregivers, and as such, demand expanded rights and protections from the state. In contrast, Korean-Chinese migrant women, who share a similar ethnic background but migrated from China to South Korea, emphasize their value as fictive-kin who can provide wholehearted care as informal workers. These divergent strategies not only result in the use of ethnicity to mark clear boundaries between the care work provided by each group, but they also (re)produce ethnically-segmented, two-tiered labour markets institutionalized by eldercare policies.

A microbiological quality evaluation on cooked food, food materials and cooking equipment was conducted in 14 school food services in Changwon area, South Korea for Ojingeochaesomoochim (vegetable salad with blanched squid) which went through cooking process after heating treatment. Only 5 schools out of the 14 (35.7%) observed the sanitization criteria of the Korean School Meals Sanitization Management for raw vegeta bles (concentration of chlorine solution: 100ppm, immersion time of sanitizing: 5 m in). The acceptance rates regarding the microbial standards for Korean school meals showed improvement before and after of sanitizat ion: for onions 57.1% vs 71.4%; cucumb er 42.9% vs. 78.6%. However, garlic showed a dverse sanitizing effect as the acceptance rate we nt down from 42.9% to 35.7%. Blanch ed squid and red pepper paste was acceptable in a ll 14 schools (100%), while squid seasoned wit h red pepper powder was acceptable in only 42.9% of the schools. Microbial results for knives, cutting boards, mixing bowls were satisfactory, however 35.7% of sanitary glov es that were put on right before the seas oning showed poor sanitization, and this i ndicated high probability of cross-contamination from the gloves. We calculated that 57.1% of th e cooked foods were in accordance with t he microbial standards for Korean school meals. Therefore, it is strongly recommended to have verification process, especially on the effectiveness of sanitization of raw vegetables, in cooking foods through cooking process after heating treatment in HACCP syst em of school food service.Key words: school food service, microbiological quality evaluation, after-heating process, HACCP system

The purpose of this study was the improvement and modification of the HACCP verification checklist in school foodservices. For this, the HACCP verification checklist was modified on the basis of an existing school foodservice format. The modified checklist was composed of 28 items, including CCPs (critical control points), microbial test, and other components of the HACCP system than CCPs. To confirm the suitability of the modified checklist, comparisons were made based on the microbiological quality of cooked foods, utensils, and number of aerial microbes in the working area. In this study, the applicability of the modified checklist was determined by focusing on cooked squid with seasoned fresh vegetables (Ojingeochaesomoochim). The following results were obtained from 14 schools in Changwon. The checklist scores for maintaining hot foods over or serving within 2 hours, microbial tests of drinking water, food contact surfaces and cooking utensils, monitoring tools, and usage of suitable sanitizers were 2 points each (The possible highest score is 2 points). On the contrary, the checklist score for microbial test of cooked foods was the lowest of all the items. The correlation coefficient (r) between the improved checklist and microbiological quality of cooked foods was 0.699 (P

The study was to provide basic data and to examine the effect of combined exercise for 12 months on functional fitness and bone mineral density (BMD) in breast cancer survivors. The subjects of this study were 40 to 60-year-old married women (N

Novel organic PAGs have been prepared in order to improve line edge roughness (LER) of 248nm and 193nm resists. From careful design of PAG, transparent, highly diffusive PAG was successfully prepared. New PAGs have increased hydrophilicity in cationic portion of PAG(photoacid generator.).

ArF lithography is pushing its limit to beyond the 100-nm node due to delay of NGL technologies to meet the aggressive insertion schedules. However, lithography process for 100-nm node with binary mask and ArF resist is still not easy to achieve and will be one of the big challenges for lithography community. Although there have been significant improvements over the past year, ArF resists remain as the most critical aspect in ArF lithography development. Areas of concern for ArF resist include; higher level of environmental instability compared to KrF materials, different response depending on the tone of reticles, and different performance exhibited between microsteppers used for initial development and full field scanners to be used in manufacturing. We expect that these problems will be getting worse in sub 100-nm node. To achieve the most challenging performance goals, the resist to be used in manufacturing will require optimization of the chemical formulation of commercialized resists based on specific design requirements, process and environmental conditions. This paper will describe an extensive DOE (design of experiments) that was performed in order to find better resist formulation from commercialized resists for our specific FAB environment. PAG, resin and amine were main three components for this DOE. After choosing the best resist for 100-nm node, we have will evaluated actual lithographic performance capability such as DOF, exposure latitude, etc.

Dissolution rate of polymer has known as one of the most profound factors to determine profiles of DUV resists. A novel copolymer, poly[4-hydroxystyrene-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (PHSCBPS), was prepared and blended with poly(4-hydroxystyrene-co-4-(1-ethylethoxystyrene)) (EEPHS) to study the effect of dissolution rate on the KrF resist profile. The dissolution rates of the blends in aqueous alkaline solution were measured by dissolution rate monitor (DRM). Molecular weight and polydispersity were measured by GPC. Without altering other components of the resist, the profile was clearly affected by the dissolution rates of the polymer blends. In this paper we will describe resist profile change according to dissolution rate, molecular weight and polydispersity of polymer blend. For given blends, the best and optimum resist profile was found in the range of 200~300 Angstroms/min dissolution rate, 12,000 of molecular weight and 1.2~1.3 of polydispersity. In case of PAG, profile of KrF resist is also influenced by counter ion of PAG. Based on the results, high performance KrF resist composition was found by incorporating appropriate photo acid generator (PAG) and other additives. Optimized resist produced rectangular profile without losing process margin and resolution.

We have developed several COMA (Cycloolefin-maleic anhydride) type resists and demonstrated their good lithographic performances, especially in the isolated line. Our resist (DHA-H110) was newly upgraded for the manufacturing of sub-100nm device in terms of bulk slope, LER (Line Edge Roughness), CD Linearity, and matching with substrate to prevent pattern collapse. The chemical structure of base resin was almost unchanged. The bulk slope resulted from high absorbency of the matrix resin was successfully overcome by introducing new additive, S1, which is an agent to remove not only top loss but also footing in the bottom. In real device application, DHA-H110 exhibits better adhesion and smaller LER than acrylate type resists on organic BARC. In addition, it shows superior pattern profile after etch process to acrylate type resists. In this paper, we suggest resist related issues for sub-100nm patterning and present lithographic performances of DHA-H110 in detail.

The effect of mixed PAGs on the performance of ArF photoresists based on cycloolefin/maleic anhydride (COMA) copolymers were investigated. Several different PAGs were prepared according to the size of photogenerated acid moiety and structure of light sensitive chromophore, and the impact of PAG property on lithographic performance was investigated in terms of the acid size, acid generation efficiency, and hydrophobicity of PAG. The diffusion according to the size of generated acid and hydrophobicity of PAG were found to be the most profound factors of the pattern profile and line edge roughness (LER) of developed resist pattern. Resolution capability as well as PED stability can be improved though adjustment of acid size, PAG hydrophobicity. Additionally, profile difference between dark and bright field according to mask type can be suppressed by the use of PAG with lower acid generation efficiency. However, lithographic performance, such as LER, pattern profile, and PED stability show the dissimilar trend with acid size and hydrophobicity of PAG. Thus, when PAG mixture is employed in a photoresist formulation, it is observed that both pattern profile and LER were improved simultaneously, which has been difficult to achieve for previously reported OCMA- based ArF resists.