229 results on '"Yamaguchi, Tomuo"'
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2. Surface etching effects of amorphous C:H and CN x:H films formed by supermagnetron plasma for field emission use
3. Optics of anisotropic nanostructures
4. Specular spectroscopic ellipsometry for the critical dimension monitoring of gratings fabricated on a thick transparent plate
5. Magneto-optic ellipsometry in exchange-coupled films
6. Matrix description of coherent and incoherent light reflection and transmission by anisotropic multilayer structures
7. A high-sensitivity particle monitor using an integration sphere
8. Optical properties of rough LaNiO 3 thin films studied by spectroscopic ellipsometry and reflectometry
9. Optical properties of NiO thin films prepared by pulsed laser deposition technique
10. Optical characterization of sol–gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions
11. Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO 2 films
12. Magnetic sensor with prism coupler
13. High purity InxGa1−xSb single crystals with cutoff wavelength of 7–8 µm grown by melt epitaxy
14. Improved purity of long-wavelength InAsSb epilayers grown by melt epitaxy in fused silica boats
15. Convergence properties of critical dimension measurements by spectroscopic ellipsometry on gratings made of various materials.
16. Modelling of 2D super-long-period multilayer gratings applied in spectral ellipsometry
17. Magnetooptical gratings with circular dots
18. Sputter-assisted plasma CVD of wide or narrow optical bandgap amorphous CNx:H films using i-C4H10/N2 supermagnetron plasma
19. Surface etching effects of amorphous C:H and CN :H films formed by supermagnetron plasma for field emission use
20. A High-Sensitivity Particle Monitor Using an Integration Sphere
21. Characteristic matrix of anisotropic coupling gap
22. Diamond-Like Amorphous Carbon Films Deposited for Field-Emission Use by Upper-Electrode-RF-Power-Controlled Supermagnetron Plasma
23. Optical Properties of InAsSb Single Crystals with Cutoff Wavelengths of 8–12 µm Grown by Melt-Epitaxy
24. High quality InAs0.04Sb0.96/GaAs single crystals with a cutoff wavelength of 12 μm grown by melt epitaxy
25. Magneto-optical spectroscopic scatterometry for analyzing patterned magnetic nanostructures
26. Optical metrology of binary arrays of holes in semiconductor media using microspot spectroscopic ellipsometry
27. Airy-like internal reflection series applied in scatterometry and simulations of gratings
28. Evidence of native oxides on the capping and substrate of Permalloy gratings by magneto-optical spectroscopy in the zeroth- and first-diffraction orders
29. Optical metrology of patterned magnetic structures: deep versus shallow gratings
30. Optical properties of rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry
31. Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films
32. Evaluation of the quality of Permalloy gratings by diffracted magneto-optical spectroscopy
33. Model dielectric functional of amorphous materials including Urbach tail
34. Electrical Properties of Melt-Epitaxy-Grown InAs0.04Sb0.96 Layers with Cutoff Wavelength of 12 µm
35. Effect of rf Power on the Properties of a-SiCS:H:F Films by rf Sputtering Using SF6
36. Spectral ellipsometry of binary optic gratings
37. Magneto-optical gratings with circular dots
38. Nanostructures for formation on surface of 6H-SiC by laser radiation
39. Nanostructures formation on surface of 6H-SiC by N2 laser radiation
40. InNAsSb Single Crystals with Cutoff Wavelength of 11–13.5 µm Grown by Melt Epitaxy
41. Magneto-optics of systems containing noncoherent propagation in thick layers
42. Magneto-optical phenomena in systems with prism coupling
43. Measurement of the dielectric function spectra of low dielectric constant using the spectroscopic ellipsometry
44. Polarized light in structures with magnetic ordering
45. Thickness monitoring of optical filters for DWDM applications
46. Amorphous SiCS:H Films Prepared by Magnetron Sputtering of Si in CH4 and H2S
47. Characteristic matrix of anisotropic coupling gap.
48. Light-Emitting Diodes with a Peak Wavelength of 5.38 µm from Liquid-Phase Epitaxial Ga0.1In0.9Sb/InSb Heterostructures
49. High quality InAs0.04Sb0.96/GaAs single crystals with a cutoff wavelength of 12 m grown by melt epitaxy.
50. Amorphous SiCS:H:F Films Prepared by Magnetron Sputtering of Si in CH4 and SF6.
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