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34. Preface

Author

Schneider, Jochen M., primary, Wong, Ming Show, additional, Stüber, Michael, additional, and Matthews, Allan, additional

Published
2020
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40. Synthesis of coatings with hardness exceeding 40 GPa by magnetron sputtering

Author

Wu, Mei-Ling, Yang, Zunde, Chung, Yip-Wah, Wong, Ming-Show, and Sproul, William D.

Subjects
Coatings -- Density, Hardness -- Testing, Electron microscopy -- Methods, Sputtering (Physics) -- Research, Science and technology
Abstract

Single- and dual-cathode DC magnetron sputtering was used to produce Ti[B.sub.2] coatings and C[N.sub.x]/ZrN multilayers, respectively, with hardness exceeding 40 GPa. The composition, structure, topography, and mechanical properties were determined by various techniques, including Auger electron spectroscopy, X-ray diffraction, high-resolution electron microscopy, atomic force microscopy, and nanoindentation. An optimum combination of the sputtering pressure and substrate bias results in the production of ultrasmooth Ti[B.sub.2] coatings with hardness up to 50 GPa and excellent wetting properties. The rationale for studying the C[N.sub.x]/ZrN system is that ZrN (111) provides excellent lattice match to the hypothetical [Beta]-[C.sub.3][N.sub.4](0001) face ([Beta]-[C.sub.3][N.sub.4] was predicted to have mechanical properties comparable to diamond). Using a dual-cathode sputtering system, we produced crystalline multilayers of C[N.sub.x]/ZrN with bilayer thickness of 1-2 nm. Using various combinations of nitrogen partial pressure, target powers, and substrate bias, we found that the hardness of these coatings correlates very strongly with the occurrence of (111) texture of ZrN, consistent with the lattice-match strategy. Even with a ZrN volume fraction of 70 percent, such multilayer coatings have been synthesized with hardness in the 50 GPa regime.

Published
1998

45. Nano-indentation studies of ultrahigh strength carbon nitride thin films

Author

Dong Li, Chung, Yip-Wah, Wong, Ming-Show, and Sproul, William D.

Subjects
Thin films -- Research, Amorphous semiconductors -- Research, Nitriding -- Research, Physics
Abstract

The characteristics of carbon nitride thin films grown by dc magnetron sputtering of a graphite target on (001) oriented Si substrates were investigated using nano-indentation studies. The results showed that the films were amorphous and had small volumes of nanocrystallites. The hardness exhibited a dependence on the deposition process parameters.

Published
1993

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