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1. Effective electrical manipulation of topological antiferromagnet by orbital Hall effect

2. Undoped Strained Ge Quantum Well with Ultrahigh Mobility Grown by Reduce Pressure Chemical Vapor Deposition

4. A Study of Selectively Digital Etching Silicon-Germanium with Nitric and Hydrofluoric Acids

7. CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology

8. A design methodology for highly reliable operation for 2T0C DRAM application based on IGZO CAA FeFETs

9. Ultrashallow heavily constrained quantum wells: The cradle for fully electrically controlled and microwave coupled quantum bits

17. Low sheet resistance buried metal bit line realized by high temperature metal CVD process in vertical channel transistor array

18. Preparation of Large Grain Size Polysilicon Using Long-Pulse Green Laser Annealing for 3-D Integration Technology

19. Effective electrical manipulation of a topological antiferromagnet by orbital torques

29. First Demonstration of True 4-bit Memory with Record High Multibit Retention >103s and Read Window >105 by Hydrogen Self-Adaptive-Doping for IGZO DRAM Arrays

30. Interface Investigation on SiGe/Si Multilayer Structures: Influence of Different Epitaxial Process Conditions

33. Demonstration of Germanium Vertical Gate-All-Around Field-Effect Transistors Featured by Self-Aligned High-κ Metal Gates with Record High Performance

46. First Demonstration of Vertical Sandwich GAA TFETs with Self-Aligned High-k Metal Gates and Abrupt Doping Tunneling Junctions

50. High-Quality Recrystallization of Amorphous Silicon on Si (100) Induced via Laser Annealing at the Nanoscale

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