20 results on '"Verhappen, Arjan"'
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2. Polarized illuminator impact on line edge roughness
3. Through pitch contact hole imaging for the 65 nm node
4. Line end shortening in CPL mask technology
5. The anaerobic fungusPiromyces sp. strain E2: nitrogen requirement and enzymes involved in primary nitrogen metabolism
6. The impact of illumination on feature fidelity for CPL mask technology
7. CPL reticle technology for advanced device applications
8. The impact of MEEF through pitch for 120-nm contact holes
9. Process, design and optical proximity correction requirements for the 65nm device generation
10. Mighty high-T lithography for 65-nm generation contacts
11. Advanced 193 tri-tone EAPSM (9%-18%) for 65 nm node
12. The impact of illumination on feature fidelity for CPL mask technology.
13. Defect printability in CPL mask technology.
14. The application of CPL reticle technology for the 0.045-mm node.
15. Mighty high-T lithography for 65-nm generation contacts.
16. RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
17. Lithography process optimization for 130-nm polygate mask and the impact of mask error factor
18. Advanced 193 tri-tone EAPSM (9%-18%) for 65 nm node.
19. The anaerobic fungus Piromyces sp. strain E2: nitrogen requirement and enzymes involved in primary nitrogen metabolism
20. The anaerobic fungus Piromyces sp. strain E2: nitrogen requirement and enzymes involved in primary nitrogen metabolism.
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